Imai Seisakusho

Single substrate clean oven − Hot air circulation / IR oven

Uniform temperature distribution, clean level and countermeasure against fume

To enlarge equipment many improvements such as mechanism to prevent fume in oven、measures for time reduction at temperature rise and fall,shortening of maintenance time and etc have been added.
It makes significant contribution to cost performance and improvement of the productivity. 

System that includes Loader, Unloader, multiple chamnbers and cooling system by robot is available.

(Robot teaching is included)

IR oven is also available./p>

 

 

※Click to enlarge


【Characteristics】

・Application : Seal cure, colour filter, Touch panel, Alley process, and others

・Size : G2〜G6(〜G8 with subcontructor)

・Mechanism to prevent fume in oven

・Uniform temperature distribution

・Clean level in oven : under Class 100

・Mechanism to prevent substrate to slide in oven

・Measures for time reduction at temperature rise and fall

・Shuttle system for Cooling unit

・Mura preventive rack support

・Various Communication including SECS, HSMS (CIM)

【Hot air circulation system】

  1. Supply fresh air with air supply blower
  2. With use of large capacity circulation blower, constant air flow and velocity is supplied horizontally to all area within oven.
  3. Clean level ≦ class 100 is guaranteed with heat resistant HEPA filter.
  4. Eliminate and collect fume with cold trap.